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Titanium dioxide (TiO2) has drawn considerable attention as an attractive inorganic raw material for various applications due to its inexpensiveness, nontoxic nature, stability, and excellent photocatalytic activity. Photocatalysis is one of the most promising route for sustainable chemistry of the 21st century. It can contribute to solving environmental, global energy, and chemical problems, as well as to the sustainable production of commodities in the near future. This book presents the fundamentals of photocatalysis in nanostructured TiO2 and describes the factors affecting the photocatalytic activity, design, and synthesis of various forms of nanostructured TiO2. It highlights the use of ion-doping and inert-atmosphere annealing to extend the light-absorption range of photocatalysts and reduce recombination between electrons and holes. It discusses numerous applications in the fields of energy and environment, such as water purification, gas sensing, storage and delivery, and energy generation. The book is an invaluable resource and useful guide for a broad readership in various fields of catalysis, materials science, environment, and energy.
Various techniques have been used to grow III-nitride heterostructures including metalorganic vapor deposition, hydride vapor epitaxy and molecular beam epitaxy (MBE). Among these techniques, MBE presents a number of advantages such as precise control of layer thickness and composition. MBE is a highly sophisticated system which thin film quality is sensitive to the growth parameters. From the literature, a systematic growth procedure has not been well-documented. This book presents an in depth understanding of MBE growth mechanism which is essential for thin film quality improvement. Detailed study on the growth mechanism allows the acquisition of the fundamental knowledge in growing precise optoelectronics device structures. This book focuses on the study of III-nitride thin films grown by MBE on various aspects, supported by analysis using a variety of structural and optical characterization techniques. The book starts with the introduction of the MBE architecture, follows by the detailed growth procedures. The characterization and analysis of various III-nitride thin films grown on Si and sapphire will be presented in the last part of the book.
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