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Elliptical Mirrors: Applications in microscopy discusses the importance of the elliptical mirror; the third solution after parabolic reflectors and lenses for which apodization factors were established in 1921 and 1959 respectively. This detailed and highly insightful book will be an important reference in a growing subject area that will benefit PhD students, optical physicists, metrologists and researchers.

This book presents singular optics in a gradual and systematic manner and bridges the gap between a seasoned researcher and a student who aims to pursue research in this topic. The book includes illustrations, examples and references that will enable the reader to conceive their own ideas as they discover more about singular optics.

Ultrasound-mediated imaging in scattering media has deep roots in condensed matter physics. This book explores these roots and provides a comprehensive review of imaging with light and ultrasound, focusing mainly on recovery of mechanical contrasts. It is suitable reference material for graduate students and practitioners in the field.

Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore''s Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. The discussion is made timely by the opening of commercial avenues for the application of EUV as it begins to be implemented in the development of 5G, AI, edge computing, VR and the Internet of Things. This book explores the theory, function and fabrication of EUV mirrors, as well as the correlation between design by Fresnel''s equations and design by photonic bands, and develops a rigorous and efficient FDTD method by applying these considerations to three simulation cases. Intended primarily for EUV industry professionals, Efficient Extreme Ultraviolet Mirror Design will be of particular use to researchers investigating large scale problems or near-field scattering problems in EUV lithography. It will serve as an excellent reference text for anyone working in or studying optical engineering, as well as a high-level introduction for researchers from other fields interested in photolithography and the FDTD method. Key Features  Addresses knowledge of extreme ultraviolet (EUV) mirrors and EUV lithography. Establishes a relation between photonic bands and Fresnel''s equation. Introduces the high reflectivity EUV mirror design rules. Applies numerical simulation for EUV mirror design. Details efficient finite-difference time-domain (FDTD) approach. 

The book presents the basic theory of lasers for a beginner and their applications in interdisciplinary field of science and technology.

The book shows the progress of integrated CMOS PIN and avalanche photodiodes as well as low-noise amplifiers. Newest research results are introduced and comprehensively detailed.

Optical Cryptosystems introduces the subject of optical cryptography and provides up-to-date coverage of optical security schemes. Optical principles, approaches, and algorithms are discussed as well as applications, including image/data encryption-decryption, watermarking, image/data hiding, and authentication verification.

An invaluable source for scientists, engineers, professors and mid-senior level students involved with data transmission and processing, this book offers an insight into data centre transport technology centres and the principal techniques for modern communication transmission of ultra-wideband channels.